发明名称 Solid-state image pick-up device and manufacturing method thereof, image-pickup apparatus, semiconductor device and manufacturing method thereof, and semiconductor substrate
摘要 A solid-state image pick-up device is provided which includes a semiconductor substrate main body which has an element forming layer and a gettering layer provided on an upper layer thereof; photoelectric conversion elements, each of which includes a first conductive type region, provided in the element forming layer; and a dielectric film which is provided on an upper layer of the gettering layer and which induces a second conductive type region in a surface of the gettering layer.
申请公布号 US8841158(B2) 申请公布日期 2014.09.23
申请号 US201314044644 申请日期 2013.10.02
申请人 Sony Corporation 发明人 Iwabuchi Shin
分类号 H01L21/00;H01L21/322;H01L31/18;H01L27/146;H01L21/762;H01L27/12 主分类号 H01L21/00
代理机构 Sheridan Ross P.C. 代理人 Sheridan Ross P.C.
主权项 1. A method for manufacturing a solid-state image pick-up device, comprising the steps of: forming photoelectric conversion elements, each of which includes a first conductive type region, in an element forming layer of a semiconductor substrate main body; forming a gettering layer on an upper layer of the element forming layer; and forming a dielectric film having a negative fixed charge on an upper layer of the gettering layer to induce a second conductive type region in a surface of the getting layer.
地址 JP