发明名称 |
Solid-state image pick-up device and manufacturing method thereof, image-pickup apparatus, semiconductor device and manufacturing method thereof, and semiconductor substrate |
摘要 |
A solid-state image pick-up device is provided which includes a semiconductor substrate main body which has an element forming layer and a gettering layer provided on an upper layer thereof; photoelectric conversion elements, each of which includes a first conductive type region, provided in the element forming layer; and a dielectric film which is provided on an upper layer of the gettering layer and which induces a second conductive type region in a surface of the gettering layer. |
申请公布号 |
US8841158(B2) |
申请公布日期 |
2014.09.23 |
申请号 |
US201314044644 |
申请日期 |
2013.10.02 |
申请人 |
Sony Corporation |
发明人 |
Iwabuchi Shin |
分类号 |
H01L21/00;H01L21/322;H01L31/18;H01L27/146;H01L21/762;H01L27/12 |
主分类号 |
H01L21/00 |
代理机构 |
Sheridan Ross P.C. |
代理人 |
Sheridan Ross P.C. |
主权项 |
1. A method for manufacturing a solid-state image pick-up device, comprising the steps of:
forming photoelectric conversion elements, each of which includes a first conductive type region, in an element forming layer of a semiconductor substrate main body; forming a gettering layer on an upper layer of the element forming layer; and forming a dielectric film having a negative fixed charge on an upper layer of the gettering layer to induce a second conductive type region in a surface of the getting layer. |
地址 |
JP |