| 发明名称 |
ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT |
| 摘要 |
Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided. |
| 申请公布号 |
US2014273520(A1) |
申请公布日期 |
2014.09.18 |
| 申请号 |
US201414182970 |
申请日期 |
2014.02.18 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
CHEBI Robert;GRANADOS Alfredo;CENG Zhao H.;WANG Jianqi;BALESAN Rajan |
| 分类号 |
H01L21/67;H01L21/02 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for processing a substrate, comprising:
a dielectric ceiling having a roughened surface; a conductive body disposed within an insulator; a substrate support; a pump port disposed within a heater jacket, the heater jacket having a plurality of heating elements disposed therein configured to maintain a uniform temperature profile of the pump port; and a plurality of heat sources configured to maintain a uniform temperature profile of the dielectric ceiling. |
| 地址 |
Santa Clara CA US |
