COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a composition from which a fine negative photoresist pattern can be formed without surface roughening, and a pattern forming method using the composition.SOLUTION: The composition for forming a fine pattern is used in a method for forming a positive resist pattern using a chemically amplified positive photoresist composition, for thinning a pattern by thickening a resist pattern. The composition comprises a polymer including an amino group in a repeating unit, a solvent, and an acid. A fine pattern can be formed by applying the above composition on a developed positive resist pattern and heating.