MEASUREMENT OF LINE-EDGE-ROUGHNESS AND LINE-WIDTH-ROUGHNESS ON PRE-LAYERED STRUCTURES

摘要

Measurements of line roughness are separated into groups depending upon pre-layers. Image data collected from similar pre-layer types are considered together in order to separate effects of line roughness from distortion of measurements caused by the pre-layers. The resulting line roughness measurements are used to estimate an aspect of line quality.

主权项

1. A method, comprising:
providing a semiconductor structure including:
a plurality of line substructures disposed in a region of the structure; anda plurality of types of pre-layers disposed over sub regions of the line substructures; scanning a line substructure to obtain data representing a raw line image; sectioning the data according to the sub regions; combining the sectioned data to create combined line images according to pre-layer types; and computing a measure of line roughness according to the combined line images.