Power supply device for plasma processing

摘要

A power supply device for plasma processing, wherein electric arcs may occur, comprises a power supply circuit for generating a voltage across output terminals, and a first switch connected between the power supply circuit and one of the output terminals. According to a first aspect the power supply device comprises a recovery energy circuit connected to the output terminals and to the power supply circuit. According to a second aspect the power supply device comprises an inductance circuit including an inductor and a second switch connected parallel to the inductor. According to a third aspect the power supply device comprises a controller for causing the power supply circuit and the first switch to be switched on and off. The controller is configured to determine a quenching time interval by means of a self-adaptive process. The quenching time interval defines the time interval during which, in an event of an arc, no voltage is generated across the output terminals.

主权项

1. A power supply device for plasma processing, wherein electric arcs may occur, comprising,
a power supply circuit for generating a voltage across output terminals, said output terminals being for connection to a plasma processing chamber by means of conductors, an interrupting switch connected between said power supply circuit and one of said output terminals for interrupting the power supply to said plasma processing chamber in case of the occurrence of an arc, and an energy recovery circuit connected to said output terminals and to said power supply circuit, said energy recovery circuit serving for feeding at least partially the energy which is stored in said conductors when said interrupting switch is actuated to interrupt the power supply to said plasma processing chamber back to said power supply circuit; wherein said power supply circuit is configured to reuse the energy fed back at least partially for the power supplied to said plasma processing chamber.