发明名称 METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a semiconductor device which can avoid a knife edge and obtain a stable and tough wafer laminate, and in addition, which can increase the number of semiconductor chips taken from one wafer.SOLUTION: A method for manufacturing a semiconductor device according to an embodiment comprises: forming a laminate by sticking a first wafer and a second wafer; rubbing a film to which a fill material is attached in a thin film shape on a gap located between a bevel of the first wafer and a bevel of the second wafer along a circumference of the laminate to bury the fill material into the gap; and thinning the first wafer.</p>
申请公布号 JP2014167966(A) 申请公布日期 2014.09.11
申请号 JP20130039025 申请日期 2013.02.28
申请人 TOSHIBA CORP 发明人 NAKAMURA KENRO;ENDO MITSUYOSHI;AZUMA KAZUYUKI;SHIRONO TAKASHI
分类号 H01L21/304 主分类号 H01L21/304
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