| 摘要 |
<p>According to a method for manufacturing a metal grating structure of the present invention, in filling a concave portion formed in a silicon substrate (30), for instance, a slit groove (SD) with metal by an electroforming method, an insulating layer (34) is formed in advance on an inner surface of the slit groove (SD) as an example of the concave portion by a thermal oxidation method. Accordingly, the metal grating structure manufacturing method is advantageous in finely forming metal parts of the grating structure. A metal grating structure of the present invention is manufactured by the above manufacturing method, and an X-ray imaging device of the present invention is incorporated with the metal grating structure.</p> |
