IN-SITU SPUTTERING APPARATUS

摘要

A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provides power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

主权项

1. A sputtering apparatus comprising:
a target presented as an inner surface of a confinement structure; a cathode adjacent the target, the cathode providing a hollow core, a first end, and a second end; a magnetron disposed within the hollow core; an actuator communicating with the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator; a cathode inlet guide mechanism supporting the cathode on the first end and communicating with the target; a cathode outlet guide mechanism supporting the cathode on the second end and communicating with the target; a cable bundle interacting with the cathode; and a cable bundle take up mechanism secured to the cable bundle.