Method of forming dielectric layer with a dielectric composition

摘要

An electronic device, such as a thin-film transistor, includes a substrate and a dielectric layer formed from a dielectric composition. The dielectric composition comprises a dielectric material and a low surface tension additive. The low surface tension additive allows for the formation of a thin, smooth dielectric layer with fewer pinholes and enhanced device yield. In particular embodiments, the dielectric material comprises a lower-k dielectric material and a higher-k dielectric material. When deposited, the lower-k dielectric material and the higher-k dielectric material form separate phases.

主权项

1. A process for fabricating an electronic device having a dielectric layer on a substrate, comprising:
depositing a dielectric composition on the substrate, the dielectric composition comprising a dielectric material and a low surface tension additive; optionally heating the dielectric composition, forming the dielectric layer on the substrate; wherein the low surface tension additive is a polyacrylate modified hydroxyl functional polysiloxane.