| 摘要 |
The present invention provides a method for manufacturing a multi-cell separation plate by using a photolithography, comprising the steps of: molding a multi-cell separation plate body with a nonconductive material; coating a photo resist on upper and lower surfaces of the molded multi-cell separation plate body; forming a boundary part at the multi-cell separation plate body by masking, exposing, and developing the photo resist; forming coating layers on the upper and lower surfaces of the multi-cell separation plate body using a conductive material; and removing the coating layers formed on the upper and lower surfaces of the boundary part of the multi-cell separation plate body. |
