Process for producing optical component, involves forming material of second structure on photoresist layer, and separating photoresist layer freed regions from photoresist layer

摘要

The method involves applying a photoresist layer (3) on the substrate (1) with the first structure (2) made of first material. The applied photoresist layer is partially removed according to second structure, so that the only the photoresist is present in the field, and no material of the second structure to be applied is present. The material (5) of the second structure is formed on the photoresist layer, and the photoresist layer freed regions (4) is separated from the photoresist layer. An independent claim is included for optical component for projection exposure apparatus for microlithography.