| 摘要 |
PROBLEM TO BE SOLVED: To provide a hair material for a polishing brush excellent in deposition resistance to a metal processing surface during use compared to a hair material for conventional polyamide polishing brush and excellent in abrasion resistance of the hair material, and exhibits persistent polishing performance, and to provide a polishing brush.SOLUTION: The hair material for a polishing brush is formed of a monofilament formed by melting spinning a resin composition containing 5 to 50 mass part of polishing material particles with respect to total 100 mass part of 97 to 65 mass% of polyamide-based resin, and a modified ethylene-tetrafluoroethylene copolymer having an adhesive functional group or 3 to 35 mass% of a modified ethylene-tetrafluoroethylene-hexafluoropropylene copolymer. |
