发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 <p>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having a sufficient effect on improvement in resolution and resist stripping characteristics.SOLUTION: The photosensitive resin composition comprises: (A) a binder polymer having a structural unit based on styrene or a styrene derivative, a structural unit based on a (meth)acrylic acid benzyl or a (meth)acrylic acid benzyl derivative, a structural unit based on a (meth)acrylic acid, and a structural unit based on a (meth)acrylic acid alkyl ester, and having a dispersion degree of 1.0 to 2.0; (B) a photopolymerizable compound; and (C) a photopolymerization initiator. The (A) binder polymer further includes at least one of a structural unit based on a (meth)acrylic acid 2-ethylhexyl ester and a structural unit based on a (meth)acrylic acid dodecyl ester.</p>
申请公布号 JP2014134815(A) 申请公布日期 2014.07.24
申请号 JP20140061919 申请日期 2014.03.25
申请人 HITACHI CHEMICAL CO LTD 发明人 MIYASAKA MASAHIRO ; MURAMATSU YUKIKO ; NAMIKAWA HANAKO
分类号 G03F7/033;C08F220/30;G03F7/004;G03F7/027;G03F7/031;H05K3/28 主分类号 G03F7/033
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