发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having a sufficient effect on improvement in resolution and resist stripping characteristics.SOLUTION: The photosensitive resin composition comprises: (A) a binder polymer having a structural unit based on styrene or a styrene derivative, a structural unit based on a (meth)acrylic acid benzyl or a (meth)acrylic acid benzyl derivative, a structural unit based on a (meth)acrylic acid, and a structural unit based on a (meth)acrylic acid alkyl ester, and having a dispersion degree of 1.0 to 2.0; (B) a photopolymerizable compound; and (C) a photopolymerization initiator. The (A) binder polymer further includes at least one of a structural unit based on a (meth)acrylic acid 2-ethylhexyl ester and a structural unit based on a (meth)acrylic acid dodecyl ester.</p> |
申请公布号 |
JP2014134815(A) |
申请公布日期 |
2014.07.24 |
申请号 |
JP20140061919 |
申请日期 |
2014.03.25 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
MIYASAKA MASAHIRO ; MURAMATSU YUKIKO ; NAMIKAWA HANAKO |
分类号 |
G03F7/033;C08F220/30;G03F7/004;G03F7/027;G03F7/031;H05K3/28 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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