PHOTOSENSITIVE COMPOUND AND METHOD OF MANUFACTURING THE SAME, AND PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME

摘要

The present technique relates to a photosensitive compound in a semiconductor process and, more specifically, to a photosensitive compound capable of improving a pattern perpendicularity and a residual film ratio in a semiconductor photolithography process, a photosensitive composition including the same, and a method of manufacturing the photosensitive compound. The photosensitive compound according to an embodiment of the present invention comprises at least one naphthoquinonediazide sulfoxy group in one molecule and at least two benzyl alcohol groups with 12 to 20 carbon atoms or one alkoxy group.