| 发明名称 |
ADJACENT FIELD ALIGNMENT IN IMPRINT LITHOGRAPHY |
| 摘要 |
<p>Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.</p> |
| 申请公布号 |
EP2462487(B1) |
申请公布日期 |
2014.07.23 |
| 申请号 |
EP20100742621 |
申请日期 |
2010.07.30 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
MCMACKIN, IAN MATTHEW;MARTIN, WESLEY |
| 分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
| 代理机构 |
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代理人 |
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