发明名称 SEMICONDUCTOR DEVICE WITH THROUGH SILICON VIA AND ALIGNMENT MARK
摘要 A semiconductor device includes: a plurality of semiconductor chips stacked on each other, each of the plurality of semiconductor chips having a semiconductor substrate and a wiring layer; a through electrode penetrating the semiconductor substrate in a thickness direction and electrically connected to each other between the semiconductor chips adjacent to each other; a conductor penetrating the semiconductor substrate in the thickness direction and not electrically connected between the other semiconductor chips; and an insulating separator penetrating the semiconductor substrate in the thickness direction and formed in a shape of a ring surrounding the conductor.
申请公布号 US2014183705(A1) 申请公布日期 2014.07.03
申请号 US201414196560 申请日期 2014.03.04
申请人 Elpida Memory, Inc. 发明人 NAKAMURA Nobuyuki
分类号 H01L23/544;H01L23/48 主分类号 H01L23/544
代理机构 代理人
主权项 1. A semiconductor device comprising: a semiconductor substrate having a first surface and a second surface located opposite to each other in a thickness direction; a semiconductor element formed on the first surface of the semiconductor substrate; a through electrode penetrating the semiconductor substrate from the first surface to the second surface and electrically connected to the semiconductor element; a conductor penetrating the semiconductor substrate from the first surface to the second surface and not electrically connected to the semiconductor element; and an insulating separator penetrating the semiconductor substrate from the first surface to the second surface and formed in a shape of a ring surrounding the conductor.
地址 Chuo-ku JP