发明名称 AVALANCHE PHOTODIODE-TYPE SEMICONDUCTOR STRUCTURE WITH LOW RESPONSE TIME AND PROCESS FOR PRODUCING SUCH A STRUCTURE
摘要 The invention relates to an avalanche photodiode-type semiconductor structure (1) intended to receive electromagnetic radiation in a given wavelength. The structure comprises a first semiconductor zone (210) with a first type of conductivity with a first longitudinal face (201), said first zone (210) being made of mercury-cadmium telluride of the CdxHg1-xTe type with a cadmium proportion x that is varied. The structure (1) also comprises at least one second semiconductor zone (310) in contact with the first zone (210), and a third semiconductor zone (410) in contact with the second zone (310). The first zone (210) comprises a doping element, such as arsenic, of which the concentration is varied alternately in a direction substantially perpendicular to the first longitudinal face (201) between a so-called low concentration and a so-called high concentration. The invention also relates to a process for producing a structure (1) according to the invention.
申请公布号 US2014183682(A1) 申请公布日期 2014.07.03
申请号 US201314143425 申请日期 2013.12.30
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT 发明人 Rothman Johan
分类号 H01L31/0296;H01L31/107;H01L31/18 主分类号 H01L31/0296
代理机构 代理人
主权项 1. An avalanche photodiode-type semiconductor structure configured to receive electromagnetic radiation in a given wavelength and comprising: a first semiconductor zone, called an absorption zone, with a first type of conductivity having a first longitudinal face intended to receive the electromagnetic radiation and a second face opposite the first face, said first zone being made of mercury-cadmium telluride of the CdxHg1-xTe type with a cadmium proportion x that is varied, at least one second semiconductor zone, called a multiplication zone, in contact on a first longitudinal face with the second face of the first zone, the second zone having a majority carrier concentration lower than that of the first zone, said second zone being adapted so as to provide a multiplication of carriers by impact ionization, a third semiconductor zone, called a collection zone, in contact with the second zone, said third zone having a second type of conductivity opposite the first type of conductivity and having a majority carrier concentration higher than that of the second semiconductor zone, wherein the first zone comprises a doping element providing at least one majority carrier corresponding to the first type of conductivity, of which the concentration is varied alternately in a direction substantially perpendicular to the first longitudinal face between a so-called low concentration and a so-called high concentration.
地址 Paris FR