METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, EVAPORATION SYSTEM AND MIST FILTER

摘要

The purpose of the present invention is to suppress an amount of particles produced when a liquid raw material is used. A substrate (200) is loaded in a processing chamber (201), and a liquid law material is sequentially fed through a vaporizer (271a) and a mist filter (300) formed by combining at least two kinds of plates (320, 330) which respectively have holes (322, 332) at different positions, thereby being vaporized, and then supplied to the processing chamber to process the substrate. Subsequently, the substrate is unloaded from the processing chamber.