发明名称 METHOD OF INSPECTING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a TEG used in evaluation of a field-effect transistor capable of preventing a gate insulating film of a field-effect transistor forming the TEG from suffering damage by an electric charge caused by a plasma process.SOLUTION: An anode of a protection diode DP is connected to a gate electrode of a MOSFET QU for evaluation via a p-channel-type MOSFET QP, and the MOSFET QU is evaluated using a TEG in which a cathode of a protection diode DN is connected to the gate electrode of the MOSFET QU via an n-channel-type MOSFET QN.
申请公布号 JP2014116507(A) 申请公布日期 2014.06.26
申请号 JP20120270504 申请日期 2012.12.11
申请人 RENESAS ELECTRONICS CORP 发明人 AONO HIDEKI;SUGIMOTO HIROMITSU;FUKUO NORITAKA
分类号 H01L21/66 主分类号 H01L21/66
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