发明名称 TRANSISTOR AND METHOD OF FABRICATING THE SAME
摘要 <p>A field effect transistor is provided. The transistor includes: an active layer and a capping layer which are successively stacked on a substrate; a source ohmic electrode and a drain ohmic electrode which are separated from each other on the capping layer; and a gate electrode which is arranged on the substrate between the source ohmic electrode and the drain ohmic electrode, penetrates the capping layer, and is connected to the active layer. The gate electrode includes a leg part which has a narrow width and is connected to the active layer, and the head part which has a wider width compared to the leg part and is located on the leg part. The leg part of the gate electrode on both end parts of the gate electrode in a direction of extending the gate electrode is narrower than the head part of the gate electrode of the residual part, and is wider than the leg part.</p>
申请公布号 KR20140079091(A) 申请公布日期 2014.06.26
申请号 KR20120148675 申请日期 2012.12.18
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 AHN, HO KYUN;LIM, JONG WON;KIM, JEONG JIN;KIM, HAE CHEON;MUN, JAE KYOUNG;NAM, EUN SOO
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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