METHOD OF MANUFACTURING GLASS SUBSTRATE WITH CONCAVE-CONVEX FLIM USING DRY ETCHING, GLASS SUBSTRATE WITH CONCAVE-CONVEX FILM, SOLAR CELL, AND METHOD OF MANUFACTURING SOLAR CELL

摘要

[Problem] A problem is to provide a method of manufacturing a glass substrate with a concave-convex film using dry etching capable of giving a fine concave-convex structure precisely by dry etching, a glass substrate with a concave-convex structure, a solar cell, and a method of manufacturing a solar cell.;[Means to Solve the Problem] In order to give a concave-convex structure to a glass substrate made of a plurality of oxides placed in different vapor pressures during dry etching, a subject film forming step and a concave-convex structure forming step are provided. The subject film forming step forms a subject film made of a single material on a flat surface of the glass substrate. The concave-convex structure forming step forms a periodic concave-convex structure in a surface of the subject film by dry etching. As a result, a fine concave-convex structure is formed precisely by dry etching.

主权项

1. A method of manufacturing a glass substrate with a concave-convex film using dry etching, the method comprising:
a subject film forming step of forming a subject film made of a single material on a flat surface of a glass substrate by sputtering process, vacuum deposition process or CVD process, the glass substrate being made of a plurality of oxides whose vapor pressures during dry etching differ from each other; and a concave-convex structure forming step of forming a periodic concave-convex structure on a surface of the subject film by dry etching, wherein the concave-convex structure has period of less than 1 μm for asperities of the concave-convex structure, the subject film has a refractive index substantially the same as that of the glass substrate, the concave-convex structure forming step includes: a mask layer forming step of forming a mask layer on the subject film; an etching step of dry etching the subject film using the mask layer as a mask; and a mask layer removing step of removing the mask layer remaining unremoved on the subject film, and the mask layer removing step removes the mask layer using dry etching.