| 发明名称 |
BONDED SUBSTRATE STRUCTURE USING SILOXANE-BASED MONOMER AND METHOD OF MANUFACTURING THE SAME |
| 摘要 |
A bonded substrate structure includes a siloxane-based monomer layer between a first substrate and a second substrate, the siloxane-based monomer layer bonding the first substrate and the second substrate. The first substrate and the second substrate may be one of a silicon substrate and a silicon oxide substrate, respectively. |
| 申请公布号 |
US2014162053(A1) |
申请公布日期 |
2014.06.12 |
| 申请号 |
US201313866389 |
申请日期 |
2013.04.19 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE Jeong-yub;WENXU Xianyu;HWANG Jun-sik;MOON Chang-youl |
| 分类号 |
B32B7/12;B32B37/12;B32B38/00 |
主分类号 |
B32B7/12 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A bonded substrate structure comprising:
a siloxane-based monomer layer between a first substrate and a second substrate, the siloxane-based monomer layer bonding the first substrate and the second substrate.
|
| 地址 |
Suwon-Si KR |
