发明名称 Nanostructure antireflective coatings for silicon substrates
摘要 <p>The deposition of nanostructures on a silicon substrate to form an antireflective coating by laying down a seed layer on the silicon substrate and heating said seed layer to grow nanostructures from said seed layer. The antireflective coating may be used on solar cells in order to improve their efficiency. The nanostructures can be nanowires and may be formed from zinc oxide. The nanostructures can be created by heating using microwave energy. The seed layer may be heated in the presence of a ZnO growth solution. A silicon nitride layer may be deposited on the nanowire layer; this layer may be made by plasma enhanced deposition.</p>
申请公布号 GB2508642(A) 申请公布日期 2014.06.11
申请号 GB20120022023 申请日期 2012.12.06
申请人 SWANSEA UNIVERSITY 发明人 OWEN GUY;YUFEI LUI;GARETH BLAYNEY
分类号 H01L31/0216;H01L21/02 主分类号 H01L31/0216
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