Method and device for reversing the feeding of sputter coating systems in clean rooms

摘要

The invention relates to a method and to a device for reversing the feeding of a sputter coating system, particularly when coating a photovoltaic module, in clean rooms, having the following characteristics: a) a transport frame (11) for receiving a substrate wafer (19) of a photovoltaic module, b) a rotary device having means for mounting the transport frame (11), having means for rotating the transport frame (11), and having means for transporting the transport frame (11), c) means for precisely aligning the rotary device relative to the sputter coating system, d) a detection device (18) for checking a sputter process, and computer program having a program code for performing the process steps.

主权项

1. A device for reversing the feeding of a sputter coating system for the purpose of repeatedly applying sputter material having a different or the same composition, in clean rooms, comprising the following features:
a) a transport frame for receiving a substrate wafer, b) a rotating unit having means for rotating the transport frame and having means for transporting the transport frame onto different guideways, c) means for aligning the rotating unit with respect to the sputter coating system, d) a detection unit for checking a sputter process, e) means for mounting the transport frame, comprising a rear fixing cylinder and a front fixing cylinder in an upper region two transport rollers in a lower region, wherein the rollers are each provided with a dedicated servodrive and mechanically moved parts are encapsulated in an emission-free manner and produced from abrasion-resistant material.