发明名称 Devices for positioning carbon nanoparticles, and systems for controlling placement of nanoparticles
摘要 The present invention is generally directed to a system for controlling placement of nanoparticles, and methods of using same. In one illustrative embodiment, the device includes a substrate and a plurality of funnels in the substrate, wherein each of the funnels comprises an inlet opening and an elongated, rectangular shaped outlet opening. In one illustrative embodiment, the method includes creating a dusty plasma comprising a plurality of carbon nanotubes, positioning a mask between the dusty plasma and a desired target for the carbon nanotubes, the mask having a plurality of openings extending therethrough, and extinguishing the dusty plasma to thereby allow at least some of the carbon nanotubes in the dusty plasma to pass through at least some of the plurality of openings in the mask and land on the target.
申请公布号 US8747557(B2) 申请公布日期 2014.06.10
申请号 US20090381088 申请日期 2009.03.05
申请人 Micron Technology, Inc. 发明人 Subramanian Krupakar Murali;Rueger Neal;Sandhu Gurtej
分类号 C23C16/00;B05D5/00 主分类号 C23C16/00
代理机构 代理人
主权项 1. A system, comprising: a plasma chamber; and a positioning mask for controlling the positioning of carbon nanoparticles from said plasma chamber passing through said mask onto a target substrate; and wherein said positioning mask comprises: a plurality of funnels in said mask, wherein each of said funnels comprises: an elongated inlet opening; an elongated outlet opening having a length of approximately 1.5-3 μm, the outlet opening being narrower than the inlet opening along at least one cross-section; wherein each of said plurality of funnels further comprises a detector for detecting a carbon nanoparticle after it has passed through said funnel.
地址 Boise ID US
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