发明名称 SOLID-STATE LASER AND INSPECTION SYSTEM USING 193NM LASER
摘要 An improved solid-state laser for generating 193 nm light is described. This laser uses the 6th harmonic of a fundamental wavelength near 1160 nm to generate the 193 nm light. The laser mixes the 1160 nm fundamental wavelength with the 5th harmonic, which is at a wavelength of approximately 232 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
申请公布号 KR20140069239(A) 申请公布日期 2014.06.09
申请号 KR20147010855 申请日期 2012.09.20
申请人 KLA-TENCOR CORPORATION 发明人 CHUANG YUNG HO ALEX;DRIBINKSI VLADIMIR;ARMSTRONG JOSEPH J.
分类号 H01S3/109;G01B11/30;G01N21/88 主分类号 H01S3/109
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