发明名称 METHOD OF INTERCONNECTING ELECTRONIC WAFERS
摘要 The method involves depositing conductive ink drop (3) with solvents on each of metallized vias (1) of an electronic wafer (T1), where the ink has metal nano-particles such as silver, gold or copper. Another electronic wafer (T2) is stacked on the wafer (T1) such that metallized vias of the wafer (T2) are superposed on the vias of the wafer (T1). Solvents of 50 to 90 percentages are removed from the drop by heating/depression to obtain a pasty ink. Drops of the pasty ink are fritted by a laser e.g. yttrium-aluminum garnet laser, to form electrical connections between the superposed vias.
申请公布号 KR101403193(B1) 申请公布日期 2014.06.02
申请号 KR20097014884 申请日期 2008.01.28
申请人 发明人
分类号 H01L21/60;H01L23/48 主分类号 H01L21/60
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