发明名称 |
Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device |
摘要 |
In one embodiment, a method for cleaning a reticle stage of an extreme ultraviolet exposure apparatus is disclosed. The method can include pressing a particle catching layer of a cleaning reticle onto the reticle stage, and the cleaning reticle includes the particle catching layer formed on a substrate. The method can include peeling the cleaning reticle from the reticle stage. The method can include removing the particle catching layer from the substrate. I addition, the method can include forming a new particle catching layer on the substrate having the particle catching layer removed. |
申请公布号 |
US8728711(B2) |
申请公布日期 |
2014.05.20 |
申请号 |
US20100971468 |
申请日期 |
2010.12.17 |
申请人 |
NAKAJIMA YUMI;KYOH SUIGEN;INANAMI RYOICHI;KABUSHIKI KAISHA TOSHIBA |
发明人 |
NAKAJIMA YUMI;KYOH SUIGEN;INANAMI RYOICHI |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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