| 摘要 |
PURPOSE: A substrate processing apparatus and method are provided to minimize the exhaust pressure difference between each exhaust hole by controlling the aperture ratio of the exhaust holes to be equal. CONSTITUTION: A substrate support member supports a substrate in a chamber. A gas supply member supplies a process gas from inside the chamber to the substrate. An exhaust member(300) discharges the process gas from the chamber to the outside. The exhaust member includes an exhaust ring(310) and a blocking plate(315). The exhaust ring includes a plurality of exhaust holes. The blocking plate controls the aperture ratio of the exhaust hole. Air is exhausted from the chamber through each exhaust hole. |
