METHOD OF ETCHING COPPER LAYER, AND MASK

摘要

PROBLEM TO BE SOLVED: To provide a method of etching a copper layer of a workpiece.SOLUTION: A mask having a pattern to be transferred to a copper layer is disposed on the copper layer. A method of etching the copper layer includes a step (a) of etching the copper layer by using plasma of a first gas containing hydrogen gas, and a step (b) of processing the workpiece by using plasma of a second gas containing hydrogen gas and a gas sedimentary to the workpiece. The step (a) of etching the copper layer by using plasma of the first gas, and the step (b) of processing the workpiece by using plasma of the second gas are repeated alternately.