发明名称 CONTAMINANT REMOVAL FURNACE
摘要 <p>PROBLEM TO BE SOLVED: To refine an ingot by that contaminant is removed from silicon sludge generated at slice working of silicon.SOLUTION: A contaminant removing furnace includes: a first crucible that includes a first filter, and stores silicon sludge; a first heater that heats the first crucible; a second crucible that includes a second filter, and stores a silicon molten liquid that penetrates the first filter; a second heater that heats the second crucible; and a third crucible that stores a silicon molten liquid that penetrates the second filter, wherein a filter particle degree of the first filter is larger than a filter particle degree of the second filter.</p>
申请公布号 JP2014076927(A) 申请公布日期 2014.05.01
申请号 JP20120226572 申请日期 2012.10.12
申请人 PANASONIC CORP 发明人 YAMADA YOSHIO ; AOKURA ISAMU ; UCHIUMI SHOGO ; TSUJI YOSHIHIRO
分类号 C01B33/037 主分类号 C01B33/037
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