发明名称 METHOD OF MANUFACTURING DETECTION DEVICE, DETECTION DEVICE MANUFACTURED THEREBY, AND DETECTION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a detection device in which image artifacts are suppressed by reducing mixing of an organic material from an interlayer insulating layer in a region outside a pixel array into an impurity semiconductor layer and a semiconductor layer of a conversion element.SOLUTION: A method of manufacturing a detection device having a plurality of conversion elements 11, each of which includes an electrode 122 electrically connected to a switch element 12 and a semiconductor layer 124 disposed on the electrode 122, performs: a first step of forming a plurality of electrodes 122 on a first region of the surface of an interlayer insulating layer 120 which is formed so as to cover a plurality of switch elements 12 and is made of an organic material, and forming a coating layer 150 made of an inorganic material on a second region located outside the first region of the surface; and a second step of forming the semiconductor layer 124 on the electrodes 122 after the first step.
申请公布号 JP2014075377(A) 申请公布日期 2014.04.24
申请号 JP20120220385 申请日期 2012.10.02
申请人 CANON INC 发明人 FUJIYOSHI KENTARO;WATANABE MINORU;YOKOYAMA KEIGO;OFUJI MASAHITO;KAWANABE JUN;WAYAMA HIROSHI
分类号 H01L27/146;H01L27/14 主分类号 H01L27/146
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