发明名称 PHOTORESISTS CONTAINING POLYMER-TETHERED NANOPARTICLES
摘要 Compositions such as photoresists and microfabrication processes are provided that can produce high-fidelity microfabricated structures. The provided photoresists can have reduced swelling during the development phase and can give tight tolerances for products, such as microneedles, that can be used, for example, in the medical field. The provided compositions include a photoresist, a photoinitiator system dispersed in the photoresist, and a polymer-tethered nanoparticle dispersed in the photoresist. The photoresist can be a negative photoresist and the photoinitiator system can include a two-photoinitiator system. The polymer-tethered nanoparticle can include an acrylic polymer and, in some embodiments, can include poly(methyl methacrylate). The nanoparticles can include silica.
申请公布号 EP2718766(A1) 申请公布日期 2014.04.16
申请号 EP20120725225 申请日期 2012.05.23
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 REDINGER, DAVID H.;DEVOE, ROBERT J.;ERDOGAN-HAUG, BELMA
分类号 G03F7/00;A61M37/00;B81C1/00;G03F7/004;G03F7/075;G03F7/20 主分类号 G03F7/00
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