| 发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN |
| 摘要 |
<p>According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.</p> |
| 申请公布号 |
KR20140043411(A) |
申请公布日期 |
2014.04.09 |
| 申请号 |
KR20137035103 |
申请日期 |
2012.06.14 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
INASAKI TAKESHI;KAWABATA TAKESHI;TSUCHIMURA TOMOTAKA |
| 分类号 |
G03F7/039;C08F212/08;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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