| 摘要 |
PURPOSE: A photoactive compound and a photo-sensitive composition including the same are provided to form fine patterns and increasing the solubility difference of an exposing part and a non-exposing part in a photo-lithography process. CONSTITUTION: A photoactive compound is represented by chemical formula 1. In chemical formula 1, the Ar corresponds to a spacer and is a divalent to tetravalent aromatic organic group; the X is a functional group, which is degradable under the irradiation of ultraviolet ray, and is selected from a group including acyl oxime groups or sulfonyl oxmine groups; the X is in connection with the ortho, the metha, the para of a part represented by the Ar; and the Y is respectively diazonaphthoquinone sulfonate or hydrogen; at least one Y is diazonaphthoquinone sulfonate. |
