发明名称 NITRIDE SEMICONDUCTOR LIGHT-EMITTING DIODE MANUFACTURING METHOD AND NITRIDE SEMICONDUCTOR LIGHT-EMITTING DIODE
摘要 PROBLEM TO BE SOLVED: To increase an area of a luminous layer to be larger than an element area.SOLUTION: A nitride semiconductor light-emitting diode manufacturing method comprises: a process of forming a mask 23 along a <1-100> direction on a surface of an n-GaN clad layer 21 by a high-melting point material (tungsten) which is solid at a crystal growth temperature; and a process of selectively growing in openings of the mask 23, n-GaN crystals 24 each surrounded by a (11-22) plane and a plane having a plane equivalent to the (11-22) plane.
申请公布号 JP2014060198(A) 申请公布日期 2014.04.03
申请号 JP20120202957 申请日期 2012.09.14
申请人 OKI ELECTRIC IND CO LTD 发明人 TAMAI ISAO
分类号 H01L33/20;H01L21/205;H01L33/16;H01L33/32 主分类号 H01L33/20
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