| 摘要 |
PROBLEM TO BE SOLVED: To provide a film thickness measurement method and a film thickness measurement device which are capable of easily and accurately obtaining a film thickness calculation result even in the case of a sample including a plurality of films.SOLUTION: In the film thickness measurement method, a sample is used which includes: a reference film having a first wavelength region and a second wavelength region different in light transmittance, the first wavelength region having lower light transmittance than the second wavelength region; one or more measurement object films formed on one side of the reference film; and one or more measurement object films formed on the other side of the reference film, and a thickness of each measurement object film is measured. A reflectance spectrum of light on the sample is measured in a part or the whole of the first wavelength region and in a part or the whole of the second wavelength region, and a thickness of each of the measurement object films formed on one side is calculated on the basis of the reflectance spectrum measured in the first wavelength region, and a thickness of each of the films formed on the other side is calculated on the basis of thicknesses of respective measurement object films formed on one side and the reflectance spectrum in the second wavelength region. |
