发明名称 CLEANING SOLUTION GENERATOR, CLEANING SOLUTION GENERATING METHOD, SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a cleaning solution generator in which cleaning performance can be enhanced, and to provide a cleaning solution generating method, a substrate cleaning device and a substrate cleaning method.SOLUTION: A cleaning solution generator 2 includes a mixing section 13 for generating a mixture by mixing hydrogen peroxide water to acidic or alkaline liquid, and raising the pressure of the mixture thus generated by the vapor generated by oxygen gas generated by decomposition of hydrogen peroxide water or reaction heat, and a bubble generating section 14 for generating multiple microbubbles in the mixture by releasing the pressure of the mixture raised by the mixing section 13.
申请公布号 JP2014053592(A) 申请公布日期 2014.03.20
申请号 JP20130119525 申请日期 2013.06.06
申请人 SHIBAURA MECHATRONICS CORP 发明人 MIYAZAKI KUNIHIRO;HAYASHI KONOSUKE
分类号 H01L21/304 主分类号 H01L21/304
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