| 摘要 |
The present invention relates a tray for a plasma cleaning apparatus capable of maximizing the cleaning effects of a cleaned object by minimizing a contact area between the tray and the cleaned object. According to the present invention, the tray for a plasma cleaning apparatus is composed of an edge member (31) having a rectangular shape and a plurality of support bars (32) spaced apart from each other at the edge member (31) so that the cleaned object (C) is positioned on the support bars (32), wherein the support bar (32) includes a base part (33) formed by quartz having a bar shape of a circular section, and a coating part (34) having a ceramic material coated on the outer peripheral portion of the base part (33). The coating part (34) includes a plurality of micro-projections (35) making contact with the cleaned object (C) achieved by finely forming concavo-convex patterns on the surface of the base part (33). |
