发明名称 RADIATION-SENSITIVE COMPOSITION, FORMATION METHOD OF CURED FILM FOR DISPLAY ELEMENT, CURED FILM FOR DISPLAY ELEMENT, AND DISPLAY ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition that can form a cured film that is excellent in definition and sensibility, and has high image development resistance, heat resistance, solvent resistance or the like.SOLUTION: A radiation-sensitive composition includes: [A] a polymerizable compound having an ethylenically unsaturated bond; and [B] a photoinitiator represented by the following formula (1). In the following formula (1), Rrepresents a morpholino group, a piperidino group, a dimethylamino group or a diethylamino group; Rand Rrepresent each independently a 1-6C alkyl group; Rand Rrepresent each independently a hydroxy group, a methylol group or a 1-6C alkyl group; n represents an integer of 0-6; and X represents an oxygen atom or a sulfur atom. Moreover. the radiation-sensitive composition preferably includes [C] an alkali-soluble resin further. Further, the radiation-sensitive composition preferably includes [D] a colorant further.
申请公布号 JP2014048428(A) 申请公布日期 2014.03.17
申请号 JP20120190690 申请日期 2012.08.30
申请人 JSR CORP 发明人 NAKAGAWA TSUYOSHI;NISHIKAWA KOJI
分类号 G03F7/031;G02F1/1333;G03F7/004;G03F7/027;G03F7/038 主分类号 G03F7/031
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