| 摘要 |
The present invention relates to a gasification device which comprises: an inlet part in which base materials and an oxygen are injected from the upper part; a reaction part which generates synthetic gas and slag by having an imperfect combustion reaction with base material injected from the inlet part and the oxygen; a slag tab which is installed in the lower part of the reaction part, discharges the synthetic gas and slag to the lower part; a cooling part in which the synthetic gas and slag discharged from the slag tab are flowed in, and which has cooling material; a synthetic gas discharging part which is installed in the lower part of the slag tab, discharges the synthetic gas to the outside by making the synthetic gas to be ascended after flowing in the synthetic gas to the cooling part; a collector which removes impurities included in the synthetic gas which is ascended from the cooling part in between the cooling part and the synthetic gas discharging part. According to the gasification device of an embodiment of the present invention, an installation space and cost are saved by not having a separated collector in the outside of the gasification device to remove the impurities included in the synthetic gas, but including the collector inside the gasification device. |
