发明名称 |
METHOD OF PROCESSING A SUBSTRATE IN A LITHOGRAPHY SYSTEM |
摘要 |
An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage. |
申请公布号 |
EP2702452(A1) |
申请公布日期 |
2014.03.05 |
申请号 |
EP20120719354 |
申请日期 |
2012.05.01 |
申请人 |
MAPPER LITHOGRAPHY IP B.V. |
发明人 |
KUIPER, VINCENT SYLVESTER;SLOT, ERWIN;VAN KERVINCK, MARCEL NICOLAAS JACOBUS;DE BOER, GUIDO;DE JONG, HENDRIK JAN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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