发明名称 Dual vertical channel transistor and fabrication method thereof
摘要 A dual vertical channel transistor includes a tuning fork-shaped substrate body; a buried bit line embedded at a bottom of a recess between two prong portions of the tuning fork-shaped substrate body; an out-diffused drain region adjacent to the buried bit line in the tuning fork-shaped substrate body; a source region situated at a top portion of each of the two prong portions of the tuning fork-shaped substrate body; an epitaxial portion connecting the two prong portions of the tuning fork-shaped substrate body between the out-diffused drain region and the source region; a front gate situated on a first side surface of the tuning fork-shaped substrate body; and a back gate situated on a second side surface opposite to the first side surface of the tuning fork-shaped substrate body.
申请公布号 US8653584(B2) 申请公布日期 2014.02.18
申请号 US20100727265 申请日期 2010.03.19
申请人 RENN SHING-HWA;NANYA TECHNOLOGY CORP. 发明人 RENN SHING-HWA
分类号 H01L29/78 主分类号 H01L29/78
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