发明名称 RESIN COMPOSITION FOR FORMATION OF PATTERN, PATTERN FORMATION METHOD, AND PROCESS FOR PRODUCTION OF LIGHT-EMITTING ELEMENT
摘要 <p>Disclosed are: a resin composition for pattern formation, which enables the stable formation of a pattern at a level of the wavelength of light; a method for forming a pattern having a sea-island structure using the composition; and a process for producing a light-emitting element that can achieve high luminous efficiency properties. The resin composition for pattern formation comprises: (a) a specific block copolymer containing an aromatic ring-containing polymer and a poly(meth)acrylate as block moieties; (b) a homopolymer of a specific aromatic ring-containing polymer; and (c) a homopolymer of a specific poly(meth)acrylate, wherein the ratio of the total amount of the aromatic ring-containing homopolymer (b) and the poly(meth)acrylate homopolymer (c) relative to the entire resin composition is 0% by weight to 90% by weight, and the total amount of an aromatic ring-containing polymer moiety contained in the block copolymer (a) as a block moiety and the aromatic ring-containing homopolymer (b) relative to the entire resin composition is 10% by weight to 60% by weight.</p>
申请公布号 KR101364382(B1) 申请公布日期 2014.02.17
申请号 KR20117026773 申请日期 2010.05.12
申请人 发明人
分类号 C08F297/00;C08L25/02;C08L33/06;H01L21/312 主分类号 C08F297/00
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