| 摘要 |
A batch substrate support device and a substrate processing device including the same are provided to process a plurality of substrates at the same time by assembling a plurality of substrate chucks and a plurality of space division plates with multilayer structures. A plurality of substrate chucks(20) are laminated up and down. A plurality of chuck support members are mounted in each substrate. The plurality of chuck support members(30) support the edges of the plurality of substrate chucks. Each chuck support member has a chuck socket. The chuck socket is connected to the chuck connection line of the substrate chuck. A chuck lift bar(40) is connected to the chuck support member. The chuck lift bar has a plurality of extension connection lines. The extension connection line is connected to the chuck socket. The plurality of space division plates(50) have the plate connection line respectively. A plurality of plate support members(60) support the edge of the plurality of space division plates. The plate lift bar(70) is connected to the plate support member. |
