发明名称 METHOD FOR PRODUCING POLYCRYSTALLINE SILICON
摘要 <p>A method for producing polycrystalline silicon, which comprises: a silicon deposition step wherein silicon is produced by a reaction between a chlorosilane compound and hydrogen; a conversion reaction step wherein the exhaust gas discharged during the silicon deposition step is brought into contact with activated carbon, so that hydrogen chloride in the exhaust gas is removed; a separation step wherein hydrogen in a post-conversion-reaction gas obtained in the conversion reaction step is separated; and a circulation step wherein the hydrogen obtained in the separation step is supplied to the silicon deposition step. This method for producing polycrystalline silicon is characterized by satisfying the condition (1) and/or condition (2) described below. (1) The post-conversion-reaction gas obtained in the conversion reaction step is brought into contact with an adsorbent that contains a Lewis acidic compound before the separation step. (2) The hydrogen obtained in the separation step is brought into contact with an adsorbent that contains a Lewis acidic compound before being supplied to the silicon deposition step.</p>
申请公布号 WO2014025052(A1) 申请公布日期 2014.02.13
申请号 WO2013JP71744 申请日期 2013.08.05
申请人 TOKUYAMA CORPORATION 发明人 MAJIMA TAKUYA;WAKAMATSU SATORU;SAKIDA MANABU
分类号 C01B33/03 主分类号 C01B33/03
代理机构 代理人
主权项
地址