发明名称 |
HIGH PRODUCTIVITY SPRAY PROCESSING FOR SEMICONDUCTOR METALLIZATION AND INTERCONNECTS |
摘要 |
Processing equipment for the metallization of a plurality of workpieces are provided. The equipment comprising a controlled atmospheric region isolated from external oxidizing ambient with at least one deposition zone for the application of a metal layer on a workpiece. A transport system moves the workpiece positioned in a batch carrier plate through the controlled atmospheric region. |
申请公布号 |
US2014033971(A1) |
申请公布日期 |
2014.02.06 |
申请号 |
US201213726169 |
申请日期 |
2012.12.23 |
申请人 |
SOLEXEL, INC.;SOLEXEL, INC. |
发明人 |
KRAMER KARL-JOSEF;ASHJAEE JAY;MOSLEHI MEHRDAD M.;CALCATERRA ANTHONY;DUTTON DAVID;KAPUR PAWAN;SEUTTER SEAN;FATEMI HOMI |
分类号 |
H01L31/18 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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