发明名称 HIGH PRODUCTIVITY SPRAY PROCESSING FOR SEMICONDUCTOR METALLIZATION AND INTERCONNECTS
摘要 Processing equipment for the metallization of a plurality of workpieces are provided. The equipment comprising a controlled atmospheric region isolated from external oxidizing ambient with at least one deposition zone for the application of a metal layer on a workpiece. A transport system moves the workpiece positioned in a batch carrier plate through the controlled atmospheric region.
申请公布号 US2014033971(A1) 申请公布日期 2014.02.06
申请号 US201213726169 申请日期 2012.12.23
申请人 SOLEXEL, INC.;SOLEXEL, INC. 发明人 KRAMER KARL-JOSEF;ASHJAEE JAY;MOSLEHI MEHRDAD M.;CALCATERRA ANTHONY;DUTTON DAVID;KAPUR PAWAN;SEUTTER SEAN;FATEMI HOMI
分类号 H01L31/18 主分类号 H01L31/18
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