| 摘要 |
The present invention provides a manufacturing method for array substrate, including: forming a first conductive layer, a first isolator layer, a second conductive layer and a second isolator layer on a substrate from bottom up, the first conductive layer for forming electrically connected scan line and control terminal of switch transistor, performing dry etch on the second isolator layer to form via hole, and forming a third conductive layer on the second isolator layer for forming data line. The present invention also provides an arrays substrate and a liquid crystal display device. As such, the present invention can reduce the possibility of electrostatic explosion during array substrate manufacturing process and improve the yield rate of array substrate. |
