| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus which can suppress occurrence of an exposure failure.SOLUTION: The exposure apparatus includes: an optical system that includes an emission surface from which exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and below the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the surface of the substrate faces the emission surface and the first and second surfaces in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate. |
