SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To prevent contamination of a substrate resulting from air bubbles by suppressing generation of the air bubbles in a processing liquid resulting from an interfacial active agent.SOLUTION: A control part 43 injects an additive processing liquid to a processing liquid with an injection pipe 33 after the temperature of the processing liquid which is circulated between an inner tank 5 and an outer tank 7 by a circulation pipeline 11 is adjusted to a processing temperature by an inline heater 15. The generation of air bubbles in the additive processing liquid can be suppressed because an interfacial active agent is mixed with the processing liquid at the normal temperature in a buffer tank 23 in advance to make the reaction at the time of addition thereof mild. When the additive processing liquid is injected to the processing liquid whose temperature has been adjusted with the injection pipe 33, sudden reaction can be suppressed even though the additive processing liquid is injected to the processing liquid whose temperature has been adjusted because the interfacial active agent and the processing liquid have been already mixed. Therefore, the generation of air bubbles in the processing liquid resulting from the interfacial active agent can be suppressed and contamination of a substrate W resulting from the air bubbles can be prevented.